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Photoluminescence from exciton-exciton scattering in a GaAs1-xNx thin film

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3 Author(s)
Hashimoto, J. ; Department of Applied Physics, Graduate School of Engineering, Osaka City University, Sugimoto, Sumiyoshi-ku, Osaka 558-8585, Japan ; Maeda, Y. ; Nakayama, M.

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We have investigated photoluminescence (PL) properties under high-density-excitation conditions at 10 K in a GaAs1-xNx thin film (x=0.008) with a narrow band-gap energy of 1.34 eV. A PL band was observed with a threshold-like nature, and its intensity was found to exhibit quadratic dependence on the excitation power. At the threshold excitation power, the PL-peak energy is lower than the energy of the fundamental exciton by the magnitude of the exciton binding energy that is ∼4 meV. The results described above indicate that the PL band originates from exciton-exciton scattering, the so-called P emission, which is typically observed in wide-gap semiconductors with large exciton binding energies. Furthermore, we have confirmed the existence of optical gain in the energy region of the P band using a variable-stripe-length method.

Published in:

Applied Physics Letters  (Volume:96 ,  Issue: 8 )