Cart (Loading....) | Create Account
Close category search window
 

Enhancement of silicon nanostructures generation using dual wavelength double pulse femtosecond laser under ambient condition

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Sivakumar, M. ; Department of Aerospace Engineering, Ryerson University, 350 Victoria Street, Toronto, ON M5B 2K3, Canada ; Tan, Bo ; Venkatakrishnan, Krishnan

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.3309422 

In this study we propose a unique method to increase the weblike silicon nanofibrous structures formation using dual wavelength double pulse femtosecond laser radiation under ambient condition. The augmentation of nanostructures is evidenced from the difference in nanofibrous structure layer thickness. Enhancement in generation is explained through the increase in excited state electrons with double pulse as compared to single pulse. Moreover the absorption characteristic of irradiated surface undergoes significant changes after the first pulse (515 nm) which enhances absorption for the second pulse (1030 nm) and consequently results in an increase in nanostructures.

Published in:

Journal of Applied Physics  (Volume:107 ,  Issue: 4 )

Date of Publication:

Feb 2010

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.