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Development of negative profile of dry film resist for metal lift off process

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8 Author(s)
Chew, M. ; Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore ; Soon Wee Ho ; Su, N. ; Ebin Liao
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A dry film photoresist was selected as the sacrificial material for a metal lift off process. However, a weak and inconsistent adhesion of the evaporated under bump metallurgy (UBM) and solder on the passivation surface was observed during the dry film stripping process. This problem may be due to the poor negative profile (88 to 89 degrees) of the patterned dry film side wall after dry film developing, resulting to inconsistent metal lift off. A few dry film predevelopment and post development parameters are identified and tested from the standard dry film development process, to obtain a negative profile of the dry film to be less than 84 degrees. After each test, cross section of the patterned dry film side wall is observed under a microscope to check if a negative profile is obtained. The 50 ¿m thick dry film at 35 mJ/cm2 with other modifications of the process gives the best results.

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Electronics Packaging Technology Conference, 2009. EPTC '09. 11th

Date of Conference:

9-11 Dec. 2009

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