Scheduled System Maintenance on December 17th, 2014:
IEEE Xplore will be upgraded between 2:00 and 5:00 PM EST (18:00 - 21:00) UTC. During this time there may be intermittent impact on performance. We apologize for any inconvenience.
By Topic

Planarization of Patterned Recording Media

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

8 Author(s)
Piramanayagam, S.N. ; Data Storage Inst., A*STAR, Singapore, Singapore ; Sbiaa, R. ; Ei-Leen Tan ; Poh, A.
more authors

The planarization of patterned recording media is essential to overcome the ¿flying height reduction¿ and ¿flying instability¿ of the head-slider. This paper reports two planarization techniques; one by compressing a morphological smooth surface onto a low glass transition temperature Tg/UV curable polymer/material coated patterned sample, while the other employs spin coating to coat patterned disks. A roughness of 0.3 nm was achieved by planarization using compression of smooth Si onto 35 K PMMA (heated above Tg to decrease its viscosity). It was also found that decreasing the spin speed from 5000 rpm to 1000 rpm improves the filling of grooves using spin coating of hydrogen silsesquioxane (HSQ) decreasing the height difference between the filled groove region and the land region from about 6 nm to 4 nm. Initial investigation using compression of smooth Si onto diluted HSQ also shows a decrease of roughness as dilution increases from 50.0% to 66.6%. Both techniques were applied in the planarization of a UV curable resist. The results show that about 1 nm is observed between the patterned and unpatterned regions using only spin coating. However, with compression using a flat mold, no height difference on average is observed.

Published in:

Magnetics, IEEE Transactions on  (Volume:46 ,  Issue: 3 )