By Topic

Reliable and Improved Nanoscale Stencil Lithography by Membrane Stabilization, Blurring, and Clogging Corrections

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Vazquez-Mena, O. ; Microsyst. Lab., Ecole Polytech. Fed. de Lausanne (EPFL), Lausanne, Switzerland ; Sidler, K. ; Savu, V. ; Park, Chan Woo
more authors

The reliable and reproducible fabrication of nanostructures by stencil lithography (SL) faces three main challenges: the stability of the thin stencil membranes with nanoapertures, the blurring of the deposited structures, and the clogging of the nanoapertures in the stencil membranes. This study reports on these three important issues and presents corresponding solutions for the patterning of nanostructures by SL. To increase the stiffness and the stability of the membranes, we have used a hexagonal array of corrugations to globally reinforce the stencil membranes. To correct the blurring, we have used a corrective etching that improves the definition of Al nanostructures. Using this corrective etching, we have fabricated poly-Si nanowires. Finally, we have used metal wet etching to remove the material accumulated on the membranes as a remedy to the clogging.

Published in:

Nanotechnology, IEEE Transactions on  (Volume:10 ,  Issue: 2 )