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Fast nano-scale texturing using the self-assembly polymer mask and wet chemical etching

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3 Author(s)
Lin, Ching-Hsi ; Photovoltaics Technol. Center, Ind. Technol. Res. Inst., Hsinchu, Taiwan ; Chen-Hsun Du ; Chung-Wen Lan

An efficient suppression of reflection in a broad spectral range can be achieved when the textured scale is comparable to the wavelength of incident light. The nano-scale texturing method is, therefore, attracting many interests in many fields. In this study, a fast nano-scale texturing method for the crystalline silicon substrate has been provided. By using the self-assembly polymer mask and wet chemical etching, an almost uniform low reflectance can be achieved. The self-assembly polymer mask was fabricated by coating the pre-prepared polymer solution onto silicon substrate followed by suitable heat treatment. In addition to being technologically easy, the process is also inexpensive.

Published in:

Photovoltaic Specialists Conference (PVSC), 2009 34th IEEE

Date of Conference:

7-12 June 2009