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High-efficiency, large-bandwidth silicon-on-insulator grating coupler based on a fully-etched photonic crystal structure

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4 Author(s)
Liu Liu ; Department of Photonics Engineering, DTU-Fotonik, Technical University of Denmark, Ørsteds Plads Bldg. 343, 2800 Lyngby, Denmark ; Minhao Pu ; Yvind, K. ; Hvam, J.M.

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A grating coupler for interfacing between single-mode fibers and photonic circuits on silicon-on-insulator is demonstrated. It consists of columns of fully etched photonic crystal holes, which are made in the same lithography and etching processes used for making the silicon-on-insulator wire waveguide. The holes have a diameter of around 143 nm, and are defined with electron-beam lithography. A peak coupling efficiency of 42% at 1550 nm and 1 dB bandwidth of 37 nm, as well as a low back reflection, are achieved. The performance of the proposed fully etched grating coupler is comparable to that based on the conventional shallowly etched grating, which needs additional fabrication steps.

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Applied Physics Letters  (Volume:96 ,  Issue: 5 )