Cart (Loading....) | Create Account
Close category search window

Low temperature silicides for thin film transistor applications in active-matrix liquid crystal display technology

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Sarcona, G. ; Dept. of Comput. Sci. & Electr. Eng., Lehigh Univ., Bethlehem, PA, USA ; Hatalis, M.K.

Thermally and chemically stable, low resistivity, and low temperature metallization is required in the driver circuitry and pixel array of active-matrix liquid crystal displays. Thin, stable scan and data lines allow flexibility in driver circuitry and panel array design. As data rates increase, the parasitic resistance of the thin-film transistors in the drivers must be minimized. Furthermore, for proper operation of both the display drivers and the active-matrix array, a reliable contact to the source and drain of the devices is required. Tungsten, cobalt, and nickel are studied for their ability to form silicides for use in active-matrix display drivers and switching elements. Thin films of tungsten, cobalt, and nickel were magnetron sputtered onto crystalline and amorphous silicon, then in-situ, in-vacuo annealed under a quartz-lamp heater. After metal etching, the sheet resistance of the resulting films was measured. The effect of surface preparation before metal deposition on the resulting film and its sheet resistance is also examined

Published in:

Active Matrix Liquid Crystal Displays, 1995. AMLCDs '95., Second International Workshop on

Date of Conference:

25-26 Sep 1995

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.