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Fabrication of a Low-Loss SSC Using High-Dose Electron Beam Lithography Exposure With Negative PMMA Resist

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5 Author(s)
Yan Liu ; Institue of semiconductor, Beijing, China ; Xuejun Xu ; Bo Xing ; Yude Yu
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A silicon-on-insulator optical fiber-to-waveguide spot-size converter (SSC) using poly-methylmethAcrylate (PMMA) is presented for integrated optical circuits. Unlike the conventional use of PMMA as a positive resist, it has been successfully used as a negative resist with high-dose electron exposure for the fabrication of ultrafine silicon wire waveguides. Additionally, this process is able to reduce the side-wall roughness, and substantially depresses the unwanted propagation loss. Exploiting this technology, the authors demonstrated that the SSC can improve coupling efficiency by as much as over 2.5 dB per coupling facet, compared with that of SSC fabricated with PMMA as a positive resist with the same dimension.

Published in:

IEEE Photonics Technology Letters  (Volume:22 ,  Issue: 7 )