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Digital circuits operating in a subthreshold region have gained wide interest due to their suitability for applications requiring ultralow power consumption with low-to-medium performance criteria. It has been demonstrated that by appropriately optimizing the devices for subthreshold logic, total energy consumption can be reduced significantly. One of the major concerns for subthreshold circuit design is increased sensitivity to process, voltage, and temperature (PVT) variations. In this paper, we critically study the effect of variations of different device and environmental parameters like gate oxide thickness, channel length, threshold voltage, supply voltage, temperature, and reverse body bias on subthreshold circuit performance for 32 nm bulk CMOS. From the study, we conclude that alternative devices like double-gate silicon-on-insulator (DGSOI) are better candidates in terms of performance, robustness and PVT insensitivity as compared to bulk circuits for both static CMOS and pseudo NMOS logic families. We also study the performance and robustness comparisons of bulk CMOS and DGSOI subthreshold basic logic gates with and without parameter variations and we observe 60-70% improvement in power delay product and roughly 50% better tolerance to PVT variations of DGSOI subthreshold logic circuits compared to bulk CMOS subthreshold circuits at the 32 nm node.