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Micromachined thick permanent magnet arrays on silicon wafers

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3 Author(s)
T. M. Liakopoulos ; Dept. of Electr. & Comput. Eng., Cincinnati Univ., OH, USA ; Wenjin Zhang ; C. H. Ahn

Using micromachining and electroplating techniques, micromachined thick CoNiMnP-based permanent magnet arrays have been designed, fabricated, and characterized for magnetic microelectromechanical systems (MEMS) device applications. The electroplated magnet arrays contain 1,500 magnets of 40 μm×40 μm×50 μm in a cubic shape on the silicon substrate of 2.5 mm×2.5 mm, where the magnets have shown a fairly high magnetic vertical coercivity of 800-1300 Oe, a retentivity of 2.0-3.0 kG, a maximum flux saturation of 12.0-13.0 kG, and a maximum energy density of 14 kJ/m3

Published in:

IEEE Transactions on Magnetics  (Volume:32 ,  Issue: 5 )