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Analysis of the Residual Gases in Several Types of High-Vacuum Evaporators

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A mass spectrometer study is made of the residual gases in several types of vacuum evaporators ranging from oil-diffusion-pumped, conventional systems to an oil-free, ultra-high-vacuum chamber. Partial pressures of water vapor, hydrogen, carbon monoxide, carbon dioxide, nitrogen, oxygen, argon and hydrocarbon vapors varied appreciably in the evaporators studied. The performance of a conventional system was improved by using special low-vapor-pressure gasket materials to minimize hydrocarbon contamination, a liquid-nitrogen trap to reduce water vapor, titanium gettering for oxygen and nickel-iron gettering for hydrogen. For thin-film deposition, the importance of thoroughly outgassing the source materials is pointed out.

Note: The Institute of Electrical and Electronics Engineers, Incorporated is distributing this Article with permission of the International Business Machines Corporation (IBM) who is the exclusive owner. The recipient of this Article may not assign, sublicense, lease, rent or otherwise transfer, reproduce, prepare derivative works, publicly display or perform, or distribute the Article.  

Published in:

IBM Journal of Research and Development  (Volume:4 ,  Issue: 2 )

Date of Publication:

April 1960

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