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A technique is described for determining refractive index dispersion throughout the uv-visible spectrum in semiconductor-related transparent thin films. The dispersion constants that have been measured can be used in the design of optical systems and in photolithography. Measurements were made with the LASER-VAMFO interferometer. Calculations and analyses are also described which show the accuracy and repeatability of the technique. Data were taken for 28 different thin-film materials, and representative refractive index dispersion curves are shown for some of them. The dispersion constants for each material evaluated are also presented.
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