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Amorphous Materials for Micrometer and Submicrometer Bubble Domain Technology

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2 Author(s)
Bajorek, C. ; IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA ; Kobliska, R.

A review and critique is made of those material and processing issues that pertain to the implementation of micrometer and submicrometer bubble devices on amorphous films. Adequate reproducibility and uniformity have been achieved in ternary amorphous films prepared by rf sputtering and their magnetic characteristics are very similar to those of analogous garnet films. Factors that may limit application to the amorphous films include defects and dielectric breakdown in insulating layers, sensitivity to annealing, and larger, but not prohibitive, coercivities. A salient problem common to both garnet and amorphous materials is attainment of sufficiently large values of Q to ensure stable device operation.

Note: The Institute of Electrical and Electronics Engineers, Incorporated is distributing this Article with permission of the International Business Machines Corporation (IBM) who is the exclusive owner. The recipient of this Article may not assign, sublicense, lease, rent or otherwise transfer, reproduce, prepare derivative works, publicly display or perform, or distribute the Article.  

Published in:

IBM Journal of Research and Development  (Volume:20 ,  Issue: 3 )

Date of Publication:

May 1976

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