By Topic

Relation Between an Atomic Electronegativity Scale and the Work Function

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $33
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

1 Author(s)
H. B. Michaelson ; IBM Corporate Headquarters, Armonk, New York 10504, USA

Recently compiled data for the first electron affinity and the first ionization potential are used to obtain values for an atomic electronegativity scale, based on the Mulliken relation. From this scale and a new compilation of work function data, a linear equation is obtained which includes a parameter for any given element, depending on its subgroup in the periodic table. Data are plotted for 51 elements, including simple metals, transition metals, and semiconductors. These data fit the straight-line equation better than 10 percent. Data for the transition metals deviate within the same limits as those for elements having simpler electronic configurations. The electronegativity scale differs significantly from the Pauling scale and is shown to be a useful guide to preferred values of the work function for elements.

Note: The Institute of Electrical and Electronics Engineers, Incorporated is distributing this Article with permission of the International Business Machines Corporation (IBM) who is the exclusive owner. The recipient of this Article may not assign, sublicense, lease, rent or otherwise transfer, reproduce, prepare derivative works, publicly display or perform, or distribute the Article.  

Published in:

IBM Journal of Research and Development  (Volume:22 ,  Issue: 1 )