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Improvement of the magnetic characteristics of multilayered Ni-Fe thin films by applying external in-plane field during sputtering

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3 Author(s)
Ichihara, T. ; Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan ; Nakagawa, S. ; Naoe, M.

Ni79Fe21 single layers and multilayers composed of Ni79Fe21 layers and paramagnetic Al interlayers were deposited using the facing targets sputtering (FTS) apparatus. During layer deposition, the external field Hex of 200 Oe along the film plane was applied parallel or transverse to the direction of the plasma confining field Hp of about 30 Oe in the FTS apparatus. The application of Hex parallel to the H p direction was not significantly effective for improving soft magnetic characteristics of the films. When Hex was applied transverse to the Hp direction, the relative permeability μr of the Ni-Fe single layers 100 nm-thick was increased, while the coercivity Hc and the squareness ratio Mr/Ms of them were not varied. On the other hand, μr of the [Ni-Fe/Al]5 multilayers was extremely and isotropically increased while Mr/Ms for the multilayers was decreased down to a half value

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Magnetics, IEEE Transactions on  (Volume:32 ,  Issue: 5 )