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E-Beam Evaporated Glass and MgO Layers for Gas Panel Fabrication

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2 Author(s)
Park, K.C. ; IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598, USA ; Weitzman, E.J.

An electron-beam evaporation process has been developed that is capable of depositing stable, thick, borosilicate glass films (0.5–50 µm) on various substrates at a rate exceeding 0.5 µm/min. A very low stress of 4–10 ×107 N/m2 in compression was obtained in freshly deposited glass films, and a further reduction below measurable levels of stress was observed after a thermal annealing at 500°C. The effects of evaporation parameter variation and thermal annealing on the film properties of the borosilicate glass layers, as well as the MgO secondary emission layers employed in the fabrication of gas discharge display panels, are presented.

Note: The Institute of Electrical and Electronics Engineers, Incorporated is distributing this Article with permission of the International Business Machines Corporation (IBM) who is the exclusive owner. The recipient of this Article may not assign, sublicense, lease, rent or otherwise transfer, reproduce, prepare derivative works, publicly display or perform, or distribute the Article.  

Published in:

IBM Journal of Research and Development  (Volume:22 ,  Issue: 6 )