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Silicon Torsional Scanning Mirror

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1 Author(s)
Petersen, K.E. ; IBM Research Division laboratory, 5600 Cottle Road, San Jose, California 95193, USA

Conventional batch photolithography and thin film techniques are employed to fabricate an electrostatically driven torsional scanning mirror from single-crystal silicon. This device is extremely simple to make and operate, has operational characteristics comparable to commercial magnetically driven high-frequency scanners, and has exhibited a promising reliability.

Note: The Institute of Electrical and Electronics Engineers, Incorporated is distributing this Article with permission of the International Business Machines Corporation (IBM) who is the exclusive owner. The recipient of this Article may not assign, sublicense, lease, rent or otherwise transfer, reproduce, prepare derivative works, publicly display or perform, or distribute the Article.  

Published in:

IBM Journal of Research and Development  (Volume:24 ,  Issue: 5 )