Proximity Effects in Electron Lithography: Magnitude and Correction Techniques

Proximity effects due to electron scattering in the resist and substrate seem to set a fundamental limit to the areal density that can be achieved in electron lithography. This work briefly reviews the form and the magnitude of the proximity function and its extent as evidenced by deviations in designed linewidths. It also discusses methods to decrease the proximity effect as well as the algorithms used for correction of such effects.