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The Mechanism of Single-Step Liftoff with Chlorobenzene in a Diazo-Type Resist

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3 Author(s)
Halverson, R.M. ; IBM General Technology Division, Burlington facility, Essex Junction, Vermont 05452, USA ; MacIntyre, M.W. ; Motsiff, W.T.

The mechanism of the chlorobenzene single-step liftoff process is defined. The chlorobenzene penetrates to some depth into the resist film during the soaking cycle, extracting residual casting solvent and low-molecular-weight resin species. The chlorobenzene is subsequently removed by a rinse cycle. The penetrated layer of resist develops at a slower rate than the underlying bulk resist, producing the liftoff structure.

Note: The Institute of Electrical and Electronics Engineers, Incorporated is distributing this Article with permission of the International Business Machines Corporation (IBM) who is the exclusive owner. The recipient of this Article may not assign, sublicense, lease, rent or otherwise transfer, reproduce, prepare derivative works, publicly display or perform, or distribute the Article.  

Published in:

IBM Journal of Research and Development  (Volume:26 ,  Issue: 5 )