By Topic

Nanolithography with a high-resolution STEM

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Umbach, C.P. ; IBM Research Division, T. J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598, USA ; Broers, A.N. ; Koch, R.H. ; Willson, C.G.
more authors

A high-resolution scanning transmission electron microscope (STEM) with a beam diameter approaching 0.6 nm has been adapted for the patterning of complex fine-line nanostructures. An IBM PC XT is used as the pattern generator to direct the scan electronics from a Cambridge Stereoscan 250 which have been interfaced with the scanning coils of the STEM. A study of the ultimate resolution of the newly designed acid-catalyzed resist poly(p-t-butyloxycarbonyloxystyrene) has been carried out. The STEM has proven to be a flexible tool in the fabrication of individual nanostructure devices for quantum transport studies in mesoscopic devices smaller than an electron phase-coherence length.

Note: The Institute of Electrical and Electronics Engineers, Incorporated is distributing this Article with permission of the International Business Machines Corporation (IBM) who is the exclusive owner. The recipient of this Article may not assign, sublicense, lease, rent or otherwise transfer, reproduce, prepare derivative works, publicly display or perform, or distribute the Article.  

Published in:

IBM Journal of Research and Development  (Volume:32 ,  Issue: 4 )