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Review of technology for 157-nm lithography

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7 Author(s)
Bates, A.K. ; IBM Storage Systems Group, 9000 South Rita Road, Tucson, Arizona 85744, USA ; Rothschild, M. ; Bloomstein, T.M. ; Fedynyshyn, T.H.
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This paper outlines the critical issues facing the implementation of 157-nm lithography as a sub-100-nm technology. The status of the present technology for mask materials, pellicles, optical materials, coatings, and resists is presented.

Note: The Institute of Electrical and Electronics Engineers, Incorporated is distributing this Article with permission of the International Business Machines Corporation (IBM) who is the exclusive owner. The recipient of this Article may not assign, sublicense, lease, rent or otherwise transfer, reproduce, prepare derivative works, publicly display or perform, or distribute the Article.  

Published in:

IBM Journal of Research and Development  (Volume:45 ,  Issue: 5 )