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Collimated Aerosol Beam Deposition: Sub-5- \mu m Resolution of Printed Actives and Passives

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10 Author(s)
Schulz, D.L. ; Dept. of Mech. Eng., North Dakota State Univ., Fargo, ND, USA ; Hoey, J.M. ; Thompson, D. ; Swenson, O.F.
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Materials deposition based upon directed aerosol flow has the potential of finding application in the field of flexible electronics where a low-temperature route to printed transistors with high mobilities remains elusive. NDSU has been actively engaged in addressing this opportunity from the following two perspectives: 1) developing an appreciation of the basic physics that dominate aerosol beam deposition toward engineering a robust method that allows the realization of deposited features with sub-5 μm resolution; and, 2) developing an understanding of the mechanistic transformations of silane-based precursor inks toward the formation of electronic materials at atmospheric-pressure. In this paper, we will briefly discuss the genesis of a new materials deposition method termed collimated aerosol beam direct-write (CAB-DW) where precision linewidth control has been realized using a combined theoretical/experimental approach. Next, we will discuss progress using Si6H12 (cyclohexasilane-a liquid silane) as a precursor for solution-processed diodes and transistors. Finally, we demonstrate the ability to CAB-DW Si6H12-based precursor inks for printing Si-based semiconductors.

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Advanced Packaging, IEEE Transactions on  (Volume:33 ,  Issue: 2 )