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Automatic measurement of electron beam size by beam metrology technique using 20 nm test pattern

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7 Author(s)
Peroz, C. ; ABeam Technologies, Inc., 5286 Dunnigan Ct., Castro Valley, California 94546 ; Babin, S. ; Machin, M. ; Anderson, E.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.3258652 

A robust operator independent measurement of electron beam sizes in two coordinates is demonstrated by using beam metrology (BEAMETR) technique. This method involves software associated with a specially designed pattern sample. The fabrication of this sample was done using 100 keV electron beam lithography and lift-off of metal. A proximity correction was applied to improve pattern quality. The minimum feature size of the fabricated BEAMETR patterns was 20 nm; this allowed for the measuring of beam size down to 2 nm. Beam size and shape measurements were done using three scanning electron microscopes; their operating conditions (voltage, aperture, and astigmatism) were varied. Repeatability and test pattern dependence were also studied, which demonstrated a good consistency of the results.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:27 ,  Issue: 6 )

Date of Publication:

Nov 2009

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