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Variability Induced by Line Edge Roughness in Double-Gate Dopant-Segregated Schottky MOSFETs

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8 Author(s)
Yunxiang Yang ; Inst. of Microelectron., Peking Univ., Beijing, China ; Shimeng Yu ; Lang Zeng ; Gang Du
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Intrinsic parameter fluctuations introduced by process variations, such as line edge roughness (LER), create an increasing challenge to the CMOS technology scaling. In this paper, variations in double-gate dopant-segregate Schottky (DSS) MOSFETs, caused by LER of silicon-fin, are systematically investigated using statistical technology computer-aided design simulations. The impact of LER on both Schottky barrier and DSS-MOSFETs are examined contrastively. The results show that DSS-MOSFETs offer a larger and more uniform drive current, but suffer a more serious Vt fluctuation. The cause of such larger Vt flutuation is also analyzed, thus providing a good starting point to propose way to solve this problem.

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Nanotechnology, IEEE Transactions on  (Volume:10 ,  Issue: 2 )