By Topic

Fabrication of 24-MHz-Disk Resonators With Silicon Passive Integration Technology

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Marc Sworowski ; NXP Semicond., Innovation Center RF, Caen, France ; FranÇois Neuilly ; Bernard Legrand ; Anand Summanwar
more authors

A new approach for the fabrication of large contour-mode single-crystal silicon resonators has been demonstrated without the use of SOI substrates. Twenty-four-megahertz disk resonators have been built thanks to industrial facilities dedicated to the integration of passive components on silicon and exhibit a good compromise between the quality factor higher than 50 000 and the motional resistance of a few kiloohms.

Published in:

IEEE Electron Device Letters  (Volume:31 ,  Issue: 1 )