By Topic

Influence of Pulse Reverse Plating on the Properties of Ni-Fe Thin Films

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
David Flynn ; Earl Mountbatten Building, Edinburgh , Heriot-Watt University, MIcroSystems Engineering Centre, School of Engineering & Physical Sciences,, Scotland,, U.K. ; Marc P. Y. Desmulliez

NiFe thin films deposited by pulse reverse (PR) electrodeposition are promising candidates for the next generation of core magnetic material to be used in magnetic components operating at high switching frequency. The influence of PR electroplating on the structural, magnetic and electrical properties of NiFe is assessed by means of a design of experiment (DOE). Results are compared to NiFe alloys produced by direct current (dc) deposition from an identical electrolyte. The PR samples exhibit an increase in resistivity and relative permeability by a factor of 2 and 1.5, respectively, in comparison to the dc samples. The coercivity and saturation flux density of the PR samples are reduced by 37% and 5%, respectively.

Published in:

IEEE Transactions on Magnetics  (Volume:46 ,  Issue: 4 )