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Use of UV to reduce particle trapping in process plasmas

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2 Author(s)
Rosenberg, M. ; Dept. of Electr. & Comput. Eng., California Univ., San Diego, La Jolla, CA, USA ; Mendis, D.A.

The use of ultraviolet (UV) radiation to reduce the negative charge on dust particles and modify force balance in particle traps in processing plasmas is investigated theoretically. Possible photophoresis associated with the UV flux is also discussed. The use of UV to facilitate moving contaminant particles from traps is considered

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Plasma Science, IEEE Transactions on  (Volume:24 ,  Issue: 3 )