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A novel 2 Degree-of-Freedom (DOF) micro-electro-mechanical systems (MEMS) mirror with sidewall electrodes is presented. The paper analyzes the effects of the serpentine torsion bar width, and bottom electrodes and sidewall electrodes on the performance of the mirror. A new fabrication process based on silicon-on-insulator (SOI) wafer and a high aspect-ratio shadow mask is presented. In comparison to the previous fabrication process and the Optical iMEMS process, the presented process is novel, simple and easy to be realized. Static and dynamic experiments indicate MEMS mirror with sidewall electrodes can realize the large scanning angle under low drive voltage. This mirror is well-suited for application where large linear angular scan at a low driving voltage is required.