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Deep-UV Technology for the Fabrication of Bragg Gratings on SOI Rib Waveguides

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10 Author(s)
Giuntoni, I. ; Tech. Univ. Berlin, Berlin, Germany ; Stolarek, D. ; Richter, H. ; Marschmeyer, S.
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In this letter, we present a wafer level technology based on deep-ultraviolet lithography to fabricate Bragg gratings on silicon-on-insulator rib waveguides. The principle of the used double-patterning technique is presented, as well the influence of the process variation on the device performances. The fabricated Bragg gratings were characterized and compared to analogue structures patterned with electron-beam lithography.

Published in:

Photonics Technology Letters, IEEE  (Volume:21 ,  Issue: 24 )

Date of Publication:

Dec.15, 2009

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