By Topic

A Novel Nanoscale 4H-SiC-on-Insulator MOSFET Using Step Doping Channel

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Ali A. Orouji ; Department of Electrical Engineering, Semnan University, Semnan, Iran ; Hossein Elahipanah

In this paper, we present the unique features exhibited by a novel step doping channel technique in nanoscale silicon carbide metal-oxide-semiconductor field-effect transistors (SDC-MOSFETs) for reaching a suitable threshold voltage upon device scaling and reliability improvement. The device demonstrates large enhancements in performance areas such as output resistance, hot-electron reliability, and threshold voltage upon channel-length or drain-voltage variation. Also, we describe an optimization technique in SDC-MOSFET for improving the threshold-voltage characterization. It was also found that the device performance is very much dependent upon the SDC region parameters. Results show that the most difficult problem of using silicon carbide in VLSI circuits could be solved and that the proposed silicon carbide MOSFETs can work very well in the nanoscale regime.

Published in:

IEEE Transactions on Device and Materials Reliability  (Volume:10 ,  Issue: 1 )