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Effects of K-rich in the targets and fabrication parameters on 0.95(K0.48Na0.52NbO3)-0.05(LiSbO3) films by pulsed laser deposition

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6 Author(s)
Lu, L. ; Coll. of Mater. Sci. & Eng., Sichuan Univ., Chengdu, China ; Xiao, D.Q. ; Sun, Y. ; Zhang, Y.B.
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0.95(K0.48Na0.52NbO3)-0.05(LiSbO3) (95KNN-5LS) thin films have been fabricated by pulsed laser deposition (PLD) on Pt/Ti/SiO2/Si substrates. The K-rich in the target and the fabrication parameters on the properties of the films was investigated. The results show that good films can be obtained with the 0.95(K0.48Na0.52NbO3)-0.05(LiSbO3)-0.0228K2CO3 (95KNN-5LS-4.56K) target, and the surface roughness, film orientation, composition and properties of the films are strongly dependent on the oxygen pressure and oblique angle from the plume axial direction in PLD process.

Published in:

Applications of Ferroelectrics, 2009. ISAF 2009. 18th IEEE International Symposium on the

Date of Conference:

23-27 Aug. 2009