A control oriented modeling methodology for plasma enhanced chemical vapor deposition processes

This paper reports on work in progress towards developing a control oriented modeling methodology for plasma enhanced chemical vapor deposition (PECVD) processes with an emphasis on spatial deposition rate uniformity. The authors' strategy contains three components: (1) a detailed computational model, (2) a control oriented reduced order model with an associated uncertainty model, and (3) experiments. The authors' computational model is based on the software package FLUENT, and as a preliminary result the authors distinguish two types of deposition rate nonuniformities. The reduced order model is derived using a Galerkin method and an associated uncertainty model is derived using a maximum principle