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On a GaN-Based Light-Emitting Diode With a p-GaN/i-InGaN Superlattice Structure

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6 Author(s)
Yi-Jung Liu ; Dept. of Electr. Eng., Nat. Cheng-Kung Univ., Tainan, Taiwan ; Chih-Hung Yen ; Li-Yang Chen ; Tsung-Han Tsai
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An interesting GaN-based light-emitting diode (LED) with a ten-period i-InGaN/p-GaN (5-nm/5-nm) superlattice (SL) structure, inserted between a multiple-quantum-well structure and a p-GaN layer, is fabricated and studied. This inserted SL can be regarded as a confinement layer of holes to enhance the hole injection efficiency. As compared with a conventional LED device without the SL structure, the studied LED exhibits better current-spreading performance and an improved quality. The turn-on voltage, at 20 mA, is decreased from 3.32 to 3.14 V due to the reduced contact resistance as well as the more uniformity of carrier injection. A substantially reduced leakage current (10-7-10-9 A) and higher endurance of the reverse current pulse are found. As compared with the conventional LED without the SL structure, the significant enhancement of 25.4% in output power and the increment of 5% in external quantum efficiency are observed.

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IEEE Electron Device Letters  (Volume:30 ,  Issue: 11 )