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Minimising the risk of defects in nano-imprint forming

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5 Author(s)
Stoyan Stoyanov ; Centre for Numerical Modelling and Process Analysis, University of Greenwich 30 Park Row, Greenwich, London SE10 9LS, UK ; Farid Amalou ; Keith Sinclair ; Chris Bailey
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Nano-imprint forming (NIF) is among the most attractive manufacturing technologies offering high yield and low-cost fabrication of three-dimensional fine structures and patterns with resolution of few nanometres. Optimising NIF process is critical for achieving high quality products and minimising the risk of commonly observed defects. Using finite element analysis, the effect of various process parameters is evaluated and design rules for safe and reliable NIF fabrication formulated. This work is part of a major UK Grand Challenge project - 3D-Mintegration - for design, simulation, fabrication, assembly and test of next generation 3D-miniaturised systems.

Published in:

2008 31st International Spring Seminar on Electronics Technology

Date of Conference:

7-11 May 2008