Close category search window
 

Investigation of ESD protection elements under high current stress in CDM-like time domain using backside laser interferometry

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

11 Author(s)
Bychikhin, S. ; Institute for Solid State Electronics, Vienna University of Technology, Floragasse 7, A-1040, Austria ; Dubec, V. ; Litzenberger, M. ; Pogany, D.
more authors

Switching dynamics and current flow homogeneity under very fast TLP (vf-TLP) stress is investigated in smart power and CMOS technology ESD protection devices by means of optical transient interferometric mapping (TIM) techniques with sub-nanosecond time resolution. Comparison between the device behavior under vf- and conventional TLP stress is discussed. The sub-ns time resolution enables a detailed insight into the triggering behavior of protection elements.

Published in:
2002 Electrical Overstress/Electrostatic Discharge Symposium, 2002. EOS/ESD '02.

Date of Conference: 6-10 Oct. 2002

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.