By Topic

Next generation processes and equipment that lead to positive environment, safety and health impacts

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Pei, P. ; SEMATECH, Austin, TX, USA ; Kerby, H.R.

The technology development needed to support continuous improvement in ESH characteristics of semiconductor manufacturing facilities is changing as strategies for source reduction, incident prevention and more refined schemes for assessing ESH improvement emerge. This paper briefly characterizes the changes taking place in ESH management structure and focuses on examples of technology development underway to satisfy the new model of ESH execution reflected in this structure change

Published in:

Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on

Date of Conference:

17-19 Sep 1995