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Heat shock structure of luciferase on wet-treated Si surface

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2 Author(s)
Nishiyama, Katsuhiko ; Tsuruoka National College of Technology, 104 Sawada, Inooka, Tsuruoka City, Yamagata 997-8511, Japan ; Hoshino, Tadatsugu

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Heat shock structure of luciferase on a wet-treated Si surface was estimated by molecular dynamics simulations. The structural changes in the active site of luciferase were smaller on the hydrophobic Si surface than on the hydrophilic Si surface at high temperature, although the structural changes in the active site of luciferase were smaller on the hydrophilic Si surface than on the hydrophobic Si surface at room temperature. The fine wet-treatment could improve the heat shock resistance of luciferase on the Si surface.

Published in:

Journal of Applied Physics  (Volume:106 ,  Issue: 5 )