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New approach: Sample preparation methodology for P-V metal void inspection

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3 Author(s)
Po Fu Chou ; United Microelectron. Corp., Ltd., Hsinchu, Taiwan ; Ru Yu Lin ; Tung-Hung Chen

The metal void information is very important for engineers to monitor the stability of the process and equipment during mass production and process tuning. However, traditional methods (X-S and P-V) are not efficient for metal void inspection. Therefore, the novel methodology is developed in this paper to provide a time efficient sample preparation method and acceptable view region for plane-view metal void inspection instead of traditional methodology. This new approach involves the bevel polish technique and metal void inspection procedure. Thus the sample will be efficiently polished on a small slope and each layer could be inspected in the SEM simultaneously. By using this methodology can create a large inspection area for metal voids and dramatically reduce the cycle time of metal void inspection procedure to help engineers quickly get accurate metal void information.

Published in:

Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the

Date of Conference:

6-10 July 2009

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