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Efficient Computer-Aided Failure Analysis of Integrated Circuits using Scanning Electron Microscopy

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2 Author(s)
William V. Oxford ; Biomedical Engineering; 152 MacNider Hall; University of North Carolina; Chapel Hill, North Carolina 27514 USA. ; Roy H. Propst

A working, operational system for computer-aided failure analysis of integrated circuits using a scanning electron microscope (SEM) is described. Statistical data analysis and image-processing algorithms are applied to digitized SEM image data. Faults are automatically identified and characterized at the single transistor level. Data-storage requirements for locating and characterizing semiconductor device failures are evaluated. A working, operational method is presented which minimizes these requirements, increases throughput, and permits a high degree of automation.

Published in:

IEEE Transactions on Reliability  (Volume:R-34 ,  Issue: 5 )