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Prospect of the high efficiency for the VEST (via-hole etching for the separation of thin films) cell

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8 Author(s)
Deguchi, M. ; Semicond. Res. Lab., Mitsubishi Electr. Corp., Hyogo, Japan ; Kawama, Y. ; Matsuno, Y. ; Nishimoto, Y.
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The optimum design of the via-holes for the “VEST cell” (polycrystalline Si solar cell) was studied. Using a simple model, fill factors of the VEST cell were calculated. As for the via-hole distribution pattern, a square grid pattern was found to be most suitable from the view points of the cell performance and the ease of electrode design. It was found that a fill factor large enough (>0.79) for high efficiency can be obtained. A fabricated test cell showed the efficiency of 14.4%. Further Improvement (efficiency over 18%) is possibly expected

Published in:

Photovoltaic Energy Conversion, 1994., Conference Record of the Twenty Fourth. IEEE Photovoltaic Specialists Conference - 1994, 1994 IEEE First World Conference on  (Volume:2 )

Date of Conference:

5-9 Dec 1994

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