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Strain distribution and interface modulation of highly lattice-mismatched InN/GaN heterostructure nanowires

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7 Author(s)
Kim, Y.H. ; Korea Research Institute of Standards and Science, 209 Gajeong-Ro, Yuseong-Gu, Daejeon 305-340, Republic of Korea ; Park, H.J. ; Kim, K. ; Kim, C.S.
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The structural properties of InN/GaN heterostructure nanowires (NWs) were studied using transmission electron microscope techniques to determine strain behavior. A great quantity of the misfit strain between InN and GaN was relaxed through the introduction of misfit dislocations along the interface. Geometric phase analysis revealed a strain-concentration phenomenon in the strain map of the out-of-plane components and a gradual lattice recovery in that of the in-plane components over the InN/GaN interface. Interface structures that were modulated at the atomic-scale were observed in several InN/GaN heterostructure NWs. Complex strain distributions were identified in both InN and GaN.

Published in:
Applied Physics Letters  (Volume:95 ,  Issue: 3 )

Date of Publication: Jul 2009

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