Referenced Items are not available for this document.
Plasma chemical jet method for deposition of amorphous silicon films is discussed. Optical properties of films are analyzed.
Published in:
Micro/Nanotechnologies and Electron Devices, 2009. EDM 2009. International Conference and Seminar on
Date of Conference: 1-6 July 2009
- Page(s):
- 59 - 61
- Print ISBN:
- 978-1-4244-4571-4
- INSPEC Accession Number:
- 10800450
- Conference Location :
- Novosibirsk
- Digital Object Identifier :
- 10.1109/EDM.2009.5173929
- Product Type:
- Conference Publications
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