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Computer Simulation of 3D Mask Image Based on Self-Adaptive Model in VLSI Lithography

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3 Author(s)
Peng fei Cao ; Sch. of Inf. Sci. & Eng., Lanzhou Univ., Lanzhou, China ; Lin Cheng ; Xiao Ping Zhang

Because the defects of the scalar quantity method for calculating 3D mask under off-axis illumination and the rigorous electromagnetic simulation method, basing on the vector Hopkins formula inferred past work, a model of adaptive Gaussian filter with scale adjustable is introduced, and new transmission cross coefficient contained parameters for lithography system is achieved. By using the arithmetic for analyzing transmission cross coefficient, it improved compute speed. As an example to TE wave, by simulating the aerial image of the three dimensional mask in actual lithography process, the inhibitor diffusion in photo resist is simulated, and the aerial image of the three dimensional mask in actual lithography process is also obtained.

Published in:

Computer Science and Information Engineering, 2009 WRI World Congress on  (Volume:3 )

Date of Conference:

March 31 2009-April 2 2009