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An on-chip process control monitor for process variability measurements in nanometer technologies

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3 Author(s)
Klass, F. ; Apple Inc., Cupertino, CA, USA ; Jain, A. ; Hess, G.

Process variability has become a fundamental challenge in nanometer technologies. This trend is driven by Moore's law, which governs the exponential growth of transistors in ICs, the low-power requirements of mobile devices (i.e., Vdd < 1 V), and the shrinking geometries of advanced technologies reaching the sub-nanometer dimensions. Understanding process variability is therefore key to successfully designing ultra low-power multi-million gate SoCs. An all-digital on-chip process control-monitor (PCM) that measures process variability is described. It is implemented in a 65 nm dual-oxide triple-Vt bulk CMOS process and it measures 0.41 mm2.

Published in:

IC Design and Technology, 2009. ICICDT '09. IEEE International Conference on

Date of Conference:

18-20 May 2009