Skip to Main Content
Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.3179154
A model of the acquisition of exchange bias during the high temperature annealing process used to set the bias direction in the antiferromagnet is described. The model is applied to the investigation of the process of setting the bias direction in the antiferromagnetic layer, which comprises a high-temperature anneal in a field sufficiently large to saturate the ferromagnetic layers. It is shown that there is an optimal setting temperature depending on the material parameters. The temperature dependence of the antiferromagnetic anisotropy is shown to be an important factor in achieving maximum exchange bias.