By Topic

An approach for matching communication patterns in parallel applications

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)
Chao Ma ; Department of Computer Science, National University of Singapore, Singapore ; Yong Meng Teo ; Verdi March ; Naixue Xiong
more authors

Interprocessor communication is an important factor in determining the performance scalability of parallel systems. The communication requirements of a parallel application can be quantified to understand its communication pattern and communication pattern similarities among applications can be determined. This is essential for the efficient mapping of applications on parallel systems and leads to better interprocessor communication implementation among others. This paper proposes a methodology to compare the communication pattern of distributed-memory programs. Communication correlation coefficient quantifies the degree of similarity between two applications based on the communication metrics selected to characterize the applications. To capture the network topology requirements, we extract the communication graph of each applications and quantities this similarity. We apply this methodology to four applications in the NAS parallel benchmark suite and evaluate the communication patterns by studying the effects of varying problem size and the number of logical processes (LPs).

Published in:

Parallel & Distributed Processing, 2009. IPDPS 2009. IEEE International Symposium on

Date of Conference:

23-29 May 2009