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Sustainability analysis of atomic layer deposition for microelectronics manufacturing

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2 Author(s)
Yuan, C.Y. ; Dept. of Mech. Eng., Univ. of California, Berkeley, CA, USA ; Dornfeld, D.

As the miniaturization trend continues in the semiconductor manufacturing industry, atomic layer deposition has received much attention in recent years due to its ability to obtain atomic layer control of film growth. The present paper analyses the sustainability of the atomic layer deposition processes, focusing on materials flow analysis and energy flow analysis.

Published in:

Sustainable Systems and Technology, 2009. ISSST '09. IEEE International Symposium on

Date of Conference:

18-20 May 2009