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Electrolytic Polishing. II

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1 Author(s)
Elmore, W.C. ; Department of Physics, Swarthmore College, Swarthmore, Pennsylvania

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1712738 

From the assumptions underlying the diffusion theory of electrolytic polishing two quantitative current‐time relations are deduced and compared with the behavior of a copper‐orthophosphoric acid cell. One equation relates the current through the cell to the time required for the growth of the concentration layer necessary for polishing. The other equation describes the fall in limiting current once the layer is formed. Both equations are in accord with the results of some simple experiments designed to test them. The present study removes some of the mystery in electrolytic polishing and permits a more intelligent use of it to be made.

Published in:

Journal of Applied Physics  (Volume:11 ,  Issue: 12 )