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On-line monitoring of perfluoro compounds in exhaust gases during semiconductor manufacture: Use of Li+ ion attachment mass spectrometry

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2 Author(s)
Fujii, Toshihiro ; National Institute for Environmental Studies, Tsukuba, Ibaraki 305-0053, Japan ; Nakamura, Megumi

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.1384857 

Li+ ion attachment mass spectrometry was used to continuously measure trace amounts of perfluoro compounds (PFCs) and byproducts in exhaust gas during semiconductor manufacture. Effluents were characterized to assess the environmental impact of dry-etching processes and operations. The feasibility of performing real-time measurements of PFCs in exhaust gas at the parts per billion level by direct introduction of the Li+ ion attachment source was demonstrated. © 2001 American Institute of Physics.

Published in:

Journal of Applied Physics  (Volume:90 ,  Issue: 5 )

Date of Publication:

Sep 2001

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